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Investigation of macroscopic uniformity during reactive ion etching of InP and its improvement by use of a guard ring
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10.1116/1.1428276
/content/avs/journal/jvstb/20/1/10.1116/1.1428276
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/20/1/10.1116/1.1428276
/content/avs/journal/jvstb/20/1/10.1116/1.1428276
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/content/avs/journal/jvstb/20/1/10.1116/1.1428276
2002-01-01
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and its improvement by use of a guard ring
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/20/1/10.1116/1.1428276
10.1116/1.1428276
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