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Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists
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10.1116/1.1511217
/content/avs/journal/jvstb/20/5/10.1116/1.1511217
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/20/5/10.1116/1.1511217
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/content/avs/journal/jvstb/20/5/10.1116/1.1511217
2002-10-04
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/20/5/10.1116/1.1511217
10.1116/1.1511217
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