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Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists
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10.1116/1.1525811
/content/avs/journal/jvstb/20/6/10.1116/1.1525811
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/20/6/10.1116/1.1525811
/content/avs/journal/jvstb/20/6/10.1116/1.1525811
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/content/avs/journal/jvstb/20/6/10.1116/1.1525811
2002-12-09
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/20/6/10.1116/1.1525811
10.1116/1.1525811
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