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Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells
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10.1116/1.1609481
/content/avs/journal/jvstb/21/5/10.1116/1.1609481
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/21/5/10.1116/1.1609481
/content/avs/journal/jvstb/21/5/10.1116/1.1609481
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/content/avs/journal/jvstb/21/5/10.1116/1.1609481
2003-09-15
2014-08-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/21/5/10.1116/1.1609481
10.1116/1.1609481
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