1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography
Rent:
Rent this article for
USD
10.1116/1.1640402
/content/avs/journal/jvstb/22/1/10.1116/1.1640402
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/1/10.1116/1.1640402
Loading

Article metrics loading...

/content/avs/journal/jvstb/22/1/10.1116/1.1640402
2004-01-14
2014-04-17
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/1/10.1116/1.1640402
10.1116/1.1640402
SEARCH_EXPAND_ITEM