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Secondary defect formation in bonded silicon-on-insulator after boron implantation
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10.1116/1.1640656
/content/avs/journal/jvstb/22/1/10.1116/1.1640656
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/1/10.1116/1.1640656
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/content/avs/journal/jvstb/22/1/10.1116/1.1640656
2004-02-04
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Secondary defect formation in bonded silicon-on-insulator after boron implantation
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/1/10.1116/1.1640656
10.1116/1.1640656
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