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High-aspect-ratio chemically assisted ion-beam etching for photonic crystals using a high beam voltage-current ratio
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10.1116/1.1767106
/content/avs/journal/jvstb/22/4/10.1116/1.1767106
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/4/10.1116/1.1767106
/content/avs/journal/jvstb/22/4/10.1116/1.1767106
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/content/avs/journal/jvstb/22/4/10.1116/1.1767106
2004-07-20
2015-03-06
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-aspect-ratio chemically assisted ion-beam etching for photonic crystals using a high beam voltage-current ratio
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/4/10.1116/1.1767106
10.1116/1.1767106
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