Schematic drawing of the rf-PECVD deposition system specifically designed for this work.
Hardcoat layout. Mass flows (oxygen and precursor) and equivalent dilution (HMDSO to ratio) as a function of deposition time. The numbers stand for location of halted depositions performed for analysis purposes: points 1 and 2 belong to the adhesion layer, 3 to the flexibility layer, and 4 to the hardening layer.
FTIR spectra in the region of the adhesion layer (top), flexibility layer (middle), and hardening layer (bottom).
Binding energy spectra for (top), (middle), and (bottom) after sputtering, corresponding to the adhesion, flexibility, and hardening layers of the protective coating.
Graphical representation of carbon, silicon, and oxygen atomic percentages as a function of position inside the multilayer hardcoating structure from XPS analysis.
(A) RBS spectrum of adhesion layer analysis. (B) Idem for flexibility layer (note overlapping of contiguous energy layers due to the excessive thickness). (C) Idem for hardening layer.
Summary of , and peak quantification for the hard coating detailed in-depth XPS truncated layer analysis. The second column shows the thickness determined by optical measurements.
Summary of Si, C, O quantification as obtained in RBS analysis of the same depositions (using graphite), also analyzed by XPS technique. The second column shows the thickness determined by optical measurements.
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