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Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopya)
a)No proof corrections received from author prior to publication.
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10.1116/1.1798871
/content/avs/journal/jvstb/22/5/10.1116/1.1798871
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/5/10.1116/1.1798871
/content/avs/journal/jvstb/22/5/10.1116/1.1798871
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/content/avs/journal/jvstb/22/5/10.1116/1.1798871
2004-10-13
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopya)
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/5/10.1116/1.1798871
10.1116/1.1798871
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