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Fabrication of masters for nanoimprint, step and flash, and soft lithography using hydrogen silsesquioxane and x-ray lithography
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10.1116/1.1807838
/content/avs/journal/jvstb/22/6/10.1116/1.1807838
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1807838

Figures

Image of FIG. 1.
FIG. 1.

Photoresist response curves upon exposure to x-ray lithography for HSQ in terms of the normalized residual thickness as a function of dose.

Image of FIG. 2.
FIG. 2.

Top-down SEM micrographs of a HSQ master that has dense line structures with critical dimensions of approximately (a) , (b) , (c) , and (d) with a depth of . The darker stripes represent the raised regions or lines on the template structures.

Image of FIG. 3.
FIG. 3.

Cross-sectional SEM micrographs of HSQ masters with dense line structures. Each master is characterized by the designed CD, height of features, actual line CD/actual space CD: (a) pitch, , ; (b) pitch, , ; (c) pitch, , ; (d) pitch, , ; (e) pitch, , ; (f) pitch, , .

Image of FIG. 4.
FIG. 4.

Top-down SEM micrographs of dense line structures with critical dimensions of (a) and (b) imprinted on a polymeric resist substrate (mr-I 8030) with a thickness of . The corresponding cross-sectional SEM images are shown in images (c) and (d), respectively. The darker stripes on the top-down SEM images represent the trenches of the imprinted structures.

Image of FIG. 5.
FIG. 5.

Top-down SEM micrographs of dense line structures with critical dimensions of imprinted on (a) a poly(dimethylsiloxane) substrate that was then used to mold the structures onto (b) a thin polyurethane film.

Tables

Generic image for table
TABLE I.

HSQ processing conditions.

Generic image for table
TABLE II.

Measurement of the contact angles of DI water on a x-ray exposed HSQ film and a substrate before and after treatment with a low surface energy release agent monomer (tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane).

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/content/avs/journal/jvstb/22/6/10.1116/1.1807838
2004-11-09
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of masters for nanoimprint, step and flash, and soft lithography using hydrogen silsesquioxane and x-ray lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1807838
10.1116/1.1807838
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