Modeling, fabrication, and experimental application of clear x-ray phase masks
Plot of the x-ray intensity profile illustrating Fresnel diffraction for the opaque material and phase contributions for partially transparent materials.
Plot of the intensity profile when the intensity profiles from two absorbers are positioned to optimally interfere. Note, each edge intensity profile shown is positioned for an absorber edge terminating at zero.
Plot of the intensity profile dependence on phase-shift angle or absorber thickness.
Plot of the intensity profiles of the enhanced bright peaks showing the curvature dependence on phase-shift angle; the intensities are normalized to the same peak value.
Plot of the regions of the aerial feature width as a function of gap.
Plot showing the good correlation between experimental data and those modeled.
SEM images from a mask feature showing feature reduction: (a) an exposure of the resist sensitivity produced a printed image of , whereas (b) an exposure of produced a printed feature of .
Plot of the experimental mask intensity profile compared to the intensity profile of an ideal absorber. Limits of the experimental dose range of and normalized dose are also shown.
Plot showing the enhanced bright peak intensity profile curvature near the peak compared to a theoretically opaque material; the peak appears little affected by phase effects when normalized for delivered dose.
Percent transmission and thickness at monochromatic wavelengths.
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