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DNA nanopatterning with self-organization by using nanoimprint
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View: Figures


Image of FIG. 1.
FIG. 1.

Schematic of the nanoimprint process on the substrate. The substrates coated with the PVA were imprinted using a mold.

Image of FIG. 2.
FIG. 2.

SEM image of the PVA nanopatterning at 5 MPa, 100 °C, for 5 min by pressing into the polymer on the substrate. The lines and spaces are (a) and (b) , and the height is about 160 nm.

Image of FIG. 3.
FIG. 3.

Preparation process of a DNA substrate by Poly-L-lysine and PVA to demonstrate the DNA nanoimprint. By exposing to UV, DNA is strongly immobilized with poly-L-lysine to produce radical molecules. PVA layer is removed easily by the water, as it is a water-soluble resist.

Image of FIG. 4.
FIG. 4.

Image of DNA nanopatterning with fluorescence microscopy. (a) A line of DNA, (b) DNA nanolines for which lines and spaces are 0.7 μm and 3 μm respectively, and (c) various DNA nanolines for region Nos. 1–4, corresponding to , and as lines and spaces, respectively.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: DNA nanopatterning with self-organization by using nanoimprint