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Towards intersubband quantum box lasers: Electron-beam lithography update
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10.1116/1.1824055
/content/avs/journal/jvstb/22/6/10.1116/1.1824055
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1824055
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

IQB laser structure. CBM is current blocking material.

Image of FIG. 2.
FIG. 2.

Transverse QB structure (Ref. 6), showing the superlattice electron injector and the QW active region.

Image of FIG. 3.
FIG. 3.

HSQ : (A) adhesion problem, (B) long-range proximity effect, (C) poor edge definition on pitch lines, (D) partial development, footing on pitch dot array, (E) footing is much less but still present in pitch dot array.

Image of FIG. 4.
FIG. 4.

HSQ . Dots are well defined and fully developed. No long range proximity effects; good 30%–50% exposure latitude.

Image of FIG. 5.
FIG. 5.

Measured point exposure distribution function with and without intermidiate oxide.

Image of FIG. 6.
FIG. 6.

Contrast curves measure on pads.

Image of FIG. 7.
FIG. 7.

In situ etch and regrowth of -wide stripes.

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/content/avs/journal/jvstb/22/6/10.1116/1.1824055
2004-12-10
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Towards intersubband quantum box lasers: Electron-beam lithography update
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1824055
10.1116/1.1824055
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