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Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography
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10.1116/1.1824951
/content/avs/journal/jvstb/22/6/10.1116/1.1824951
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1824951

Figures

Image of FIG. 1.
FIG. 1.

Michelson interferometer immersion exposure setup.

Image of FIG. 2.
FIG. 2.

TOK-ILP03 resist exposures through half-pitch.

Image of FIG. 3.
FIG. 3.

AZ Clariant EXP M3000-50 resist exposures through half-pitch.

Image of FIG. 4.
FIG. 4.

Impact of soak times on pitch TOK-ILP06 resist.

Image of FIG. 5.
FIG. 5.

pitch contact holes in AZ Clariant EXP M3000 resist.

Tables

Generic image for table
TABLE I.

TOK resist formation matrix.

Generic image for table
TABLE II.

AZ clariant resist formulation matrix.

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/content/avs/journal/jvstb/22/6/10.1116/1.1824951
2004-12-14
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1824951
10.1116/1.1824951
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