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Application of ion beam etching technique to the direct fabrication of silicon microtip arrays
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10.1116/1.1826061
/content/avs/journal/jvstb/22/6/10.1116/1.1826061
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1826061
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Figures

Image of FIG. 1.
FIG. 1.

Schematic illustration of the fabrication of element microtip arrays in silicon substrate using photolithography, thermal shaping, argon ion beam etching, and sputtering deposition. (A) Photolithography; (B) fabrication of photoresist mask; (C) thermal shaping and consolidation; (D) ion beam etching; (E) silicon microtip; (F) ion beam sputtering and materials depositing; and (G) field emission device.

Image of FIG. 2.
FIG. 2.

SEM photographs of the square-bottom and circle-bottom circle-microtip arrays in silicon substrate. (A) Outline of silicon pattern. (B) Distribution of microparticles on silicon samples.

Image of FIG. 3.
FIG. 3.

Rough surfaces of silicon samples fabricated.

Image of FIG. 4.
FIG. 4.

SEM photographs of samples fabricated. (A) Photoresist pattern with basic square-bottom arch structure; (B) square-bottom pyramid-shaped silicon microtip array.

Image of FIG. 5.
FIG. 5.

SEM photographs of samples fabricated. (A) Photoresist pattern with basic circle-bottom spherical structure; (B) cone-shaped silicon microtip array.

Image of FIG. 6.
FIG. 6.

Relation between the sharpness of the silicon microtip and argon ion beam energy.

Image of FIG. 7.
FIG. 7.

Field emission characteristics of the fabricated devices with cone-shaped microtip structure and pyramid-shaped microtip structure in low current range.

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/content/avs/journal/jvstb/22/6/10.1116/1.1826061
2004-12-09
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Application of ion beam etching technique to the direct fabrication of silicon microtip arrays
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1826061
10.1116/1.1826061
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