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Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes
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10.1116/1.1827219
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    Affiliations:
    1 Institute of Fluid Science, Tohoku University, Katahira 2-1-1 Aoba-ku Sendai 980-8577, Japan and Sanyo Electric Co., Ltd., Component Group, Semiconductor Company, CCD Business Unit, Development Department, 180 Ohmori, Anpachi-cho, Anpachi-gun, Gifu 503-0195, Japan
    2 Institute of Fluid Science, Tohoku University, Katahira 2-1-1 Aoba-ku Sendai 980-8577, Japan
    3 Sanyo Electric Co., Ltd., Materials and Devices Development Center Business Unit, SoC Devices Department, 180 Ohmori, Anpachi-cho, Anpachi-gun, Gifu 503-0195, Japan
    4 Institute of Fluid Science, Tohoku University, Katahira 2-1-1 Aoba-ku Sendai 980-8577, Japan
    a) Electronic mail: samukawa@ifs.tohoku.ac.jp
    J. Vac. Sci. Technol. B 22, 2818 (2004); http://dx.doi.org/10.1116/1.1827219
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2004-11-24
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/22/6/10.1116/1.1827219
10.1116/1.1827219
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