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High-temperature self-grown layer against Cu diffusion at interface
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10.1116/1.1839911
/content/avs/journal/jvstb/23/1/10.1116/1.1839911
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/1/10.1116/1.1839911
/content/avs/journal/jvstb/23/1/10.1116/1.1839911
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/content/avs/journal/jvstb/23/1/10.1116/1.1839911
2005-01-05
2015-03-04
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-temperature self-grown ZrO2 layer against Cu diffusion at Cu(2.5at.%Zr)∕SiO2 interface
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/1/10.1116/1.1839911
10.1116/1.1839911
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