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Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
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10.1116/1.1849213
/content/avs/journal/jvstb/23/1/10.1116/1.1849213
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/1/10.1116/1.1849213
/content/avs/journal/jvstb/23/1/10.1116/1.1849213
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/content/avs/journal/jvstb/23/1/10.1116/1.1849213
2005-01-05
2014-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/1/10.1116/1.1849213
10.1116/1.1849213
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