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Quantifying acid generation efficiency for photoresist applications
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10.1116/1.1851537
/content/avs/journal/jvstb/23/1/10.1116/1.1851537
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/1/10.1116/1.1851537

Figures

Image of FIG. 1.
FIG. 1.

Nonaqueous titration curves at varying exposure doses for the (weak) DTBPI-Camphorsulfonate PAG.

Image of FIG. 2.
FIG. 2.

Nonaqueous titration curves at varying exposure doses for the (strong) DTBPI-Nonaflate PAG.

Image of FIG. 3.
FIG. 3.

Plot of vs exposure energy for the titration data of Fig. 2. Quantum efficiency is calculated from the photolysis rate constant (slope) and Eq. (20).

Tables

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TABLE I.

Quantum efficiency results at 248 nm for the PAGs in this study.

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/content/avs/journal/jvstb/23/1/10.1116/1.1851537
2005-01-13
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Quantifying acid generation efficiency for photoresist applications
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/1/10.1116/1.1851537
10.1116/1.1851537
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