Fabrication of gap pillar electrodes by electron-beam deposition
Tilted-view SEM image of the pads isolated by FIB milling and bridged by tilted pillar electrodes grown by electron beam deposition.
Top-view SEM images of the pillar electrodes: (a) After tilted deposition, (b) after of SEM imaging within the dashed perimeter under precursor gas flow, and (c) at , when gas flow was stopped.
(a) TEM image and (b) TEM diffraction pattern of pillar electrode tips, as deposited. (c) TEM image and (d) TEM diffraction pattern of the tips, after of high-current TEM irradiation.
Tilted-view SEM image of the three-electrode structure. The gap between the tilted electrodes is , the gap between the tilted and the central electrodes is 9 and for the left and right electrode, respectively.
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