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Fabrication of gap pillar electrodes by electron-beam deposition
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10.1116/1.1872015
/content/avs/journal/jvstb/23/2/10.1116/1.1872015
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/2/10.1116/1.1872015
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Tilted-view SEM image of the pads isolated by FIB milling and bridged by tilted pillar electrodes grown by electron beam deposition.

Image of FIG. 2.
FIG. 2.

Top-view SEM images of the pillar electrodes: (a) After tilted deposition, (b) after of SEM imaging within the dashed perimeter under precursor gas flow, and (c) at , when gas flow was stopped.

Image of FIG. 3.
FIG. 3.

(a) TEM image and (b) TEM diffraction pattern of pillar electrode tips, as deposited. (c) TEM image and (d) TEM diffraction pattern of the tips, after of high-current TEM irradiation.

Image of FIG. 4.
FIG. 4.

Tilted-view SEM image of the three-electrode structure. The gap between the tilted electrodes is , the gap between the tilted and the central electrodes is 9 and for the left and right electrode, respectively.

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/content/avs/journal/jvstb/23/2/10.1116/1.1872015
2005-04-05
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of 5nm gap pillar electrodes by electron-beam Pt deposition
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/2/10.1116/1.1872015
10.1116/1.1872015
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