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Magnetic metal etching with organic based plasmas. I. plasmas
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10.1116/1.1935530
/content/avs/journal/jvstb/23/4/10.1116/1.1935530
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1935530
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Mass spectra of CO in gas flows and plasmas at different ratios.

Image of FIG. 2.
FIG. 2.

Stacked mass spectrum of 15% CO in gas flow. The “stacked” spectrum is shown beginning at (bottom left) and is plotted in segments that are vertically spaced to aid in the identification of species that participate in clusters with multiple argon atoms. Water clusters of the form are marked with asterisks.

Image of FIG. 3.
FIG. 3.

Mass spectra of and gas flows.

Image of FIG. 4.
FIG. 4.

Stacked mass spectrum of 15% CO in plasma. The “stacked” spectrum is shown beginning at (bottom left) and is plotted in segments that are vertically spaced to aid in the identification of species that participate in clusters with multiple argon atoms. Water clusters of the form are marked with asterisks.

Image of FIG. 5.
FIG. 5.

Mass spectra of (bottom), (middle), and (top) plasmas. The anticipated isotopic shifts for the chemical identifications described within the text are indicated with arrows.

Image of FIG. 6.
FIG. 6.

Proposed surface chemical mechanism that results in the observed products.

Image of FIG. 7.
FIG. 7.

Etch rates measured for plasmas. The plasma conditions were forward power, dc bias, and pressure.

Image of FIG. 8.
FIG. 8.

Common metallo-organic precursors used for chemical vapor deposition.

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/content/avs/journal/jvstb/23/4/10.1116/1.1935530
2005-07-21
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Magnetic metal etching with organic based plasmas. I. CO∕H2 plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1935530
10.1116/1.1935530
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