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Metal etching with organic based plasmas. II. plasmas
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10.1116/1.1935531
/content/avs/journal/jvstb/23/4/10.1116/1.1935531
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1935531
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Mass spectra of CO in gas flows and plasmas at different ratios. The spacing between spectra corresponds to 300 counts.

Image of FIG. 2.
FIG. 2.

Stacked mass spectrum of 10% CO in gas flow. In a “stacked” spectrum a large mass range is shown in vertically-spaced 40 amu segments. The bottom curve represents , the one above that is , and the top curve is . The stacked spectrum aids in the identification of species that participate in clusters with multiple argon atoms, as they propagate vertically. Guidelines are included to show the diagonal pattern of peaks that results from repeat units of 36 amu, i.e., peaks related by two molecules.

Image of FIG. 3.
FIG. 3.

Stacked mass spectrum of 10% CO in plasma. In a “stacked” spectrum a large mass range is shown in vertically-spaced 40 amu segments. The bottom curve represents , the one above that is , and the top curve is .

Image of FIG. 4.
FIG. 4.

Mass spectra of CO in plasmas over the range from to 80.

Image of FIG. 5.
FIG. 5.

Proposed surface chemical mechanism that results in the observed products.

Image of FIG. 6.
FIG. 6.

Common metallo-organic precursors used for chemical vapor deposition.

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/content/avs/journal/jvstb/23/4/10.1116/1.1935531
2005-07-21
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Metal etching with organic based plasmas. II. CO∕NH3 plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1935531
10.1116/1.1935531
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