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Patterned growth of self-assembled silicon nanostructures by ion implantation and electron beam annealing
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10.1116/1.1941189
/content/avs/journal/jvstb/23/4/10.1116/1.1941189
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1941189
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Plan view AFM images of the boundary between the unimplanted and the implanted regions, (a) before and (b) after EBA. Implantation of the Si(100) substrate was performed with at a fluence of and the samples were annealed at for .

Image of FIG. 2.
FIG. 2.

plan view AFM image of self-assembled silicon nanostructures formed on the unimplanted and annealed region of Fig. 1(b).

Image of FIG. 3.
FIG. 3.

top view AFM images of a Si(100) surface following EBA and implantation with of . Inset: AFM image of surface region masked from implantation.

Image of FIG. 4.
FIG. 4.

top view AFM image of surface morphology resulting from EBA of Si(100) substrates preimplanted with at a fluence of (a) , (b) , and (c) .

Image of FIG. 5.
FIG. 5.

plan view AFM image of a nanostructure grid pattern fabricated by EBA of a Si(100) substrate preimplanted with at a fluence of through a copper grid.

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/content/avs/journal/jvstb/23/4/10.1116/1.1941189
2005-07-20
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Patterned growth of self-assembled silicon nanostructures by ion implantation and electron beam annealing
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1941189
10.1116/1.1941189
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