Plan view AFM images of the boundary between the unimplanted and the implanted regions, (a) before and (b) after EBA. Implantation of the Si(100) substrate was performed with at a fluence of and the samples were annealed at for .
plan view AFM image of self-assembled silicon nanostructures formed on the unimplanted and annealed region of Fig. 1(b).
top view AFM images of a Si(100) surface following EBA and implantation with of . Inset: AFM image of surface region masked from implantation.
top view AFM image of surface morphology resulting from EBA of Si(100) substrates preimplanted with at a fluence of (a) , (b) , and (c) .
plan view AFM image of a nanostructure grid pattern fabricated by EBA of a Si(100) substrate preimplanted with at a fluence of through a copper grid.
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