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Dynamically ordered thin film nanoclusters
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10.1116/1.1941207
/content/avs/journal/jvstb/23/4/10.1116/1.1941207
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1941207
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Figures

Image of FIG. 1.
FIG. 1.

Schematic of the experimental approach used for in situ fabrication of nanostructured lines during pulsed laser deposition. Two -polarized laser beams interfere on the Si substrate surface with an interference angle of during the Co film deposition via e-beam evaporation.

Image of FIG. 2.
FIG. 2.

Morphology, RDF and size histogram of thick Co films deposited with (a)–(c) and without (d)–(f) two-beam laser interference irradiation. (a) AFM topographic image showing the one-dimensional ordering of spaced arrays of Co nanodots; (b) RDF showing diffraction spots representing ordering in a direction perpendicular to the arrays (-direction) (a); (c) histogram of particle diameter from (a). (d) Plan-view TEM micrograph of the unirradiated Co film; (e) RDF showing the random distribution of Co clusters; (f) histogram of particle diameter in the unirradiated sample.

Image of FIG. 3.
FIG. 3.

Morphology of thick Co film deposited with two-beam laser interference irradiation on Si at room temperature. The SEM image shows evidence for the spacing but is comprised of irregularly shaped particles reminiscent of coalescing metal islands, usually observed at high temperatures.

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/content/avs/journal/jvstb/23/4/10.1116/1.1941207
2005-07-25
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dynamically ordered thin film nanoclusters
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1941207
10.1116/1.1941207
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