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Ideally ordered anodic porous alumina with Sub- hole intervals based on imprinting using metal molds
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10.1116/1.1941247
/content/avs/journal/jvstb/23/4/10.1116/1.1941247
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1941247
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Figures

Image of FIG. 1.
FIG. 1.

Schematic for fabrication of ideally ordered anodic porous alumina using metal molds. Electron beam exposure (a); development (b); Pt layer coating (c); Ni electrodeposition (d); removal of resist (e); imprinting (f); array of concaves on Al (g); obtained anodic porous alumina (h).

Image of FIG. 2.
FIG. 2.

SEM images of a resist pattern (a), and Ni mold (b) with pattern of interval of .

Image of FIG. 3.
FIG. 3.

AFM image of ordered concaves on Al formed by imprinting using Ni mold along with sectional profile.

Image of FIG. 4.
FIG. 4.

SEM image of ideally ordered anodic porous alumina with hole interval. Anodization was carried out at in at for . Pore-widening treatment was performed in phosphoric acid at for .

Image of FIG. 5.
FIG. 5.

SEM images of Ni mold with ordered array of convexes at intervals.

Image of FIG. 6.
FIG. 6.

SEM images of ideally ordered anodic porous alumina with hole intervals. Anodization was carried out at in at for . Pore-widening treatment was carried out in phosphoric acid at for .

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/content/avs/journal/jvstb/23/4/10.1116/1.1941247
2005-07-25
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ideally ordered anodic porous alumina with Sub-50nm hole intervals based on imprinting using metal molds
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/4/10.1116/1.1941247
10.1116/1.1941247
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