Diagram of reaction chamber components.
X-ray diffraction patterns for predominately -axis (a) and mixed -axis oriented (b) YBCO films.
(a,b) AFM micrograph of a YBCO -axis surface before (a) and after (b) etching.
AFM micrograph of YBCO -axis surface after etching. Left side of specimen was protected against reaction with the by photoresist, which was then removed for the AFM measurements. Average step height: .
(a,b) AFM micrograph of YBCO mixed -axis surface (a) before and (b) after etching.
SEM micrograph of -axis surface showing Cu-rich particulates protruding from the after etching.
Auger spectrograph (AES) of the (dark) particulates and (light) background regions shown in the SEM micrograph of Fig. 6.
Composition profiles of an -axis oriented pair for (a) unetched and (b) etched surfaces.
ESCA depth profile of the barium energy peak in a YBCO specimen before and after reaction with . The energy of the shift near the surface is larger after the processing.
Plot of YBCO film resistance as a function of temperature for same film before and after etching.
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