No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Optimization of an inductively coupled plasma etching process of based material for photonic band gap applicationsa)
a)No proof corrections received from author prior to publication.
Data & Media loading...
Article metrics loading...
Full text loading...