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Cross beam lithography and dip pen nanolithography for nanoparticle conductivity measurements
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10.1116/1.2062647
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    Affiliations:
    1 TASC-INFM at ELETTRA-Sincrotrone Trieste, S.S. 14, km 163.5 in Area Science Park, I-34017 Basovizza-Trieste, Italy
    2 Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
    3 TASC-INFM at ELETTRA-Sincrotrone Trieste, S.S.14, km 163.5 in Area Science Park, I-34017 Basovizza-Trieste, Italy
    4 TASC-INFM at ELETTRA-Sincrotrone Trieste, S.S.14, km 163.5 in Area Science Park, I-34017 Basovizza-Trieste, Italy and Department of Applied Physics, Osaka University, Yamadoaka, 2-1, Suita, Osaka 565-0871, Japan
    5 Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
    6 TASC-INFM at ELETTRA-Sincrotrone Trieste, S.S.14, km 163.5 in Area Science Park, I-34017 Basovizza-Trieste, Italy and Università della Magna Graecia, Viale Europa, Campus Germaneto, 88100 Catanzaro, Italy
    a) Author to whom correspondence should be addressed; electronic mail: stefano.cabrini@elettra.trieste.it
    J. Vac. Sci. Technol. B 23, 2806 (2005); http://dx.doi.org/10.1116/1.2062647
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/content/avs/journal/jvstb/23/6/10.1116/1.2062647
2005-12-02
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Cross beam lithography (FIB+EBL) and dip pen nanolithography for nanoparticle conductivity measurements
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2062647
10.1116/1.2062647
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