Model 5C X-ray lithography stepper system.
Updated, self-guiding operator interface screens allow for easy job monitoring and control.
Stage during milling at Wessdel Mfg. In CA and detail of flat zones.
Actual and Model views of the Model 5C alignment system hardware.
Schematic of the Interferometric-Spatial-Phase Imaging (ISPI) alignment scheme.
Selected mask ISPI images, angle detection mark and fine alignment grating.
Butte format x-ray mask.
X-ray mask images of Butte masks developed at CNTech. Shown are the outer regions of a Fresnel zone plate with a pitch of , and contact hole opening.
Lithography results achieved using the model 5C at CNTech. Left: an absorber mask with a test pattern containing cells with wall. Right: The test pattern, printed into a positive resist.
Article metrics loading...
Full text loading...