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Development, installation, and performance of the x-ray stepper JSAL 5Ca)
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Image of FIG. 1.
FIG. 1.

Model 5C X-ray lithography stepper system.

Image of FIG. 2.
FIG. 2.

Updated, self-guiding operator interface screens allow for easy job monitoring and control.

Image of FIG. 3.
FIG. 3.

Stage during milling at Wessdel Mfg. In CA and detail of flat zones.

Image of FIG. 4.
FIG. 4.

Actual and Model views of the Model 5C alignment system hardware.

Image of FIG. 5.
FIG. 5.

Schematic of the Interferometric-Spatial-Phase Imaging (ISPI) alignment scheme.

Image of FIG. 6.
FIG. 6.

Selected mask ISPI images, angle detection mark and fine alignment grating.

Image of FIG. 7.
FIG. 7.

Butte format x-ray mask.

Image of FIG. 8.
FIG. 8.

X-ray mask images of Butte masks developed at CNTech. Shown are the outer regions of a Fresnel zone plate with a pitch of , and contact hole opening.

Image of FIG. 9.
FIG. 9.

Lithography results achieved using the model 5C at CNTech. Left: an absorber mask with a test pattern containing cells with wall. Right: The test pattern, printed into a positive resist.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Development, installation, and performance of the x-ray stepper JSAL 5Ca)