(a) Calculated intensity distribution behind a grating illuminated by a normally incident monochromatic plane wave. The grating consists of open slits in a perfectly absorbing film. The period of the pattern and the wavelength are and , respectively. (b) Profiles of the image at two image planes, and .
(a) Calculated intensity distribution showing the achievement of stationary image using wideband illumination. (b) Profile of the image in part (a) along a vertical line running across the center of the image (i.e., ). (c) Mask transmission and the profile of the stationary intensity distribution obtained at large . The plots correspond to cross sections of the image in part (a) at and .
(a) Transmission of the two-dimensional mask showing four unit cells of the periodic structure. (b) and (c) Calculated images at two positions. (d) Profiles of the images in (a) and (c) along the dashed lines.
(a) One-dimensional mask pattern etched into Cr and layers. (b) Pattern in PMMA obtained using the mask in (a) in an ASFM exposure.
(a) Two-dimensional array of through holes in a stack of films consisting of . (b) Array of diameter Cr dots obtained by using the mask in (a) in an ASFM exposure followed by a lift-off process.
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