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Fabrication of wave plate by nanocasting lithography
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10.1116/1.2127953
/content/avs/journal/jvstb/23/6/10.1116/1.2127953
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2127953
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Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of advanced nanophotonic devices using high-aspect-ratio structure. The future size is subwavelength and the aspect ratio is expected to be over 10: (a) wave plate for optical pickup systems and (b) optical–optical switch using resonance.

Image of FIG. 2.
FIG. 2.

Fatal defect of Si mold after high-pressure thermal nanoimprint for high-aspect-ratio pattern. The pattern pitch of the mold is and the depth of the groove is around .

Image of FIG. 3.
FIG. 3.

Process flow of a nanocasting lithography (NCL) using conventional lithographic tools: (a) spin coating a polymer on a fine mold, (b) spin coat an UV cure resin, (c) set substrate plate on it and UV exposure by contact exposure system, and (d) releasing the mold.

Image of FIG. 4.
FIG. 4.

SEM photo of the half-pitch pattern using the conventional NCL process by atmosphere baking for the solvent evaporation (PMMA on PC substrate): (a) low magnification image and (b) high magnification image.

Image of FIG. 5.
FIG. 5.

SEM photo of the half-pitch pattern using the revised NCL process by vacuum baking for the solvent evaporation (PMMA on PC substrate): (a) low magnification image and (b) high magnification image.

Image of FIG. 6.
FIG. 6.

SEM photo of the high-aspect-ratio micropillars by NCL process (PMMA on PC substrate): (a) low magnification image and (b) high magnification image.

Image of FIG. 7.
FIG. 7.

SEM photo of the high-aspect-ratio nanogratings by NCL process (PC on PC substrate, pitch, in height, field area: ): (a) low magnification image and (b) high magnification image.

Image of FIG. 8.
FIG. 8.

Measured phase-deviation characteristics of the high-aspect-ratio nanogratings. The incident light is wavelength.

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/content/avs/journal/jvstb/23/6/10.1116/1.2127953
2005-12-02
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of 1∕4 wave plate by nanocasting lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2127953
10.1116/1.2127953
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