1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Towards nano-fluidics by solvent deformation of electron beam resist
Rent:
Rent this article for
USD
10.1116/1.2131876
/content/avs/journal/jvstb/23/6/10.1116/1.2131876
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2131876
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Sketches of a cross-section through UV-3 resist ribs used for making nano-fluidics. (a) The written pattern. (b) Tubes are not formed if the capillary forces during drying are weaker than the inherent strength of the ribs. (c) The net cohesive and adhesive component forces that bend the 2 ribs towards each other. (d) An enclosed channel sealed at the apex is formed if the conditions are favorable.

Image of FIG. 2.
FIG. 2.

Scanning electron micrographs of rib-pairs in plan-view. The separation ranges in 40 nm increments from 130 nm in row (a) to 490 nm in row (j). The structures in the left-hand column were all developed in a normal UV-3 developer-IPA sequence, and the structures on the right were developed in an acetone-IPA sequence.

Image of FIG. 3.
FIG. 3.

Scanning electron micrographs of rib-pairs in plan-view. The separation ranges in 40 nm increments from 130 nm in row (a) to 490 nm in row (j). The structures in the left-hand column were all developed in a normal UV-3 developer-water sequence, and the structures on the right were developed in an acetone-water sequence.

Image of FIG. 4.
FIG. 4.

Cross-section, after cleaving the substrate, through a typical structure.

Image of FIG. 5.
FIG. 5.

Scanning electron micrographs of rib-pairs in plan view designed to incorporate a Y- or T-junction. All ribs shown are in 440nm thick resist exposed at . (a) and (b) show Y-junctions developed using normal UV-3 developer-water whereas (c) and (d) show Y-junctions developed in acetone-water. (e) and (f) show T-junctions developed using normal UV-3 developer-water whereas (g) and (h) show T-junctions developed in acetone-water.

Loading

Article metrics loading...

/content/avs/journal/jvstb/23/6/10.1116/1.2131876
2005-12-02
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Towards nano-fluidics by solvent deformation of electron beam resist
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2131876
10.1116/1.2131876
SEARCH_EXPAND_ITEM