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Ultrathin pore-seal film by plasma enhanced chemical vapor deposition SiCH from tetramethylsilane
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10.1116/1.2132324
/content/avs/journal/jvstb/23/6/10.1116/1.2132324
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2132324
/content/avs/journal/jvstb/23/6/10.1116/1.2132324
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/content/avs/journal/jvstb/23/6/10.1116/1.2132324
2005-11-11
2014-09-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultrathin pore-seal film by plasma enhanced chemical vapor deposition SiCH from tetramethylsilane
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/23/6/10.1116/1.2132324
10.1116/1.2132324
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