Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniquesa)
Dense lines and spaces in Shipley for the four highest contrast levels that printed. Resist thickness—.
Dense lines and spaces in Shipley for the lowest four contrast levels that printed. Resist thickness—.
Roughness seen in Shipley resist for dense lines as a function of contrast. Resist thickness—.
Dense features printed in Shipley using the MET. Resist thickness—.
Diffracted orders from a linear phase grating. For the lowest orders, light is only directed into the direction (modified image from Ref. 9).
Simulations on contrast variation using an absorptive phase mask. As less light is allowed through the 0° and 90° phase levels, the image gains contrast.
Multiple-contrast imaging using an absorptive phase mask. Four different transmission amounts are used for 0° and 90° phase levels. These transmission amounts produce different contrasts in the image field. Cutlines for each transmission amount are on the right.
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