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Hot-wire chemical-vapor-deposited nanometer range diffusion barrier films for ultralarge-scale-integrated application
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10.1116/1.2166862
/content/avs/journal/jvstb/24/2/10.1116/1.2166862
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/2/10.1116/1.2166862
/content/avs/journal/jvstb/24/2/10.1116/1.2166862
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/content/avs/journal/jvstb/24/2/10.1116/1.2166862
2006-02-08
2014-12-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hot-wire chemical-vapor-deposited nanometer range a-SiC:H diffusion barrier films for ultralarge-scale-integrated application
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/2/10.1116/1.2166862
10.1116/1.2166862
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