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Chemical bonding and interdiffusion in scaled down stacks with top oxide formed by thermal ed copyoxidation
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10.1116/1.2209990
/content/avs/journal/jvstb/24/4/10.1116/1.2209990
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/4/10.1116/1.2209990
/content/avs/journal/jvstb/24/4/10.1116/1.2209990
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/content/avs/journal/jvstb/24/4/10.1116/1.2209990
2006-06-28
2014-07-11
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical bonding and interdiffusion in scaled down SiO2∕Si3N4∕SiO2 stacks with top oxide formed by thermal ed copyoxidation
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/4/10.1116/1.2209990
10.1116/1.2209990
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