1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Shot noise models for sequential processes and the role of lateral mixing
Rent:
Rent this article for
USD
10.1116/1.2218875
/content/avs/journal/jvstb/24/4/10.1116/1.2218875
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/4/10.1116/1.2218875

Figures

Image of FIG. 1.
FIG. 1.

SEM of contact holes nominally square in KRS resist exposed with electrons. The required dose is on more than twice that needed to clear large areas.

Image of FIG. 2.
FIG. 2.

Plot of fraction of contact holes opened as a function of the average number of exposing electrons/hole. Note that about 4500 electrons are needed independent of resist thickness for hole size in the range of on a side.

Image of FIG. 3.
FIG. 3.

SEM of partially developed line showing what appears to be a surface layer acting as a partial barrier to development.

Image of FIG. 4.
FIG. 4.

SEM of a developed Shipley UVII-HS resist line illustrating both linewidth variation and line-edge roughness (Ref. 24).

Image of FIG. 5.
FIG. 5.

Model of the effect of fracturing during the development of resist. The exposure and reaction generates polar inhomogeneities, the polar developer penetrates and causes local stress, and the fracture follows the path of least resistance.

Tables

Generic image for table
TABLE I.

Energy required to generate one acid under exposure with photons and photons and electron exposure and the acid (or ionization) density at this energy density (see text).

Loading

Article metrics loading...

/content/avs/journal/jvstb/24/4/10.1116/1.2218875
2006-07-10
2014-04-24
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Shot noise models for sequential processes and the role of lateral mixing
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/4/10.1116/1.2218875
10.1116/1.2218875
SEARCH_EXPAND_ITEM