Schematic diagram for the PE-ALD system.
Growth rate of thermal and PE-ALD as a function of water exposure time on Si(100) substrate at .
Growth rate of PE-ALD and TaN as a function of growth temperature on Si(100) substrates.
X-ray diffraction spectra of the thermal ALD films deposited at 250, 350, and on Si(100) substrate. Also shown is the XRD spectrum of the film deposited at followed by annealing at .
XPS spectra of (a) Ta , (b) O , and (c) N for thermal ALD from PDMAT reacting with water at 150, 250, and .
RBS data for PE-ALD film with thickness. The growth temperature was .
XPS spectra of (a) Ta , (b) O , and (c) N for thermal ALD from PDMAT reacting with .
Illustrations showing the reaction schemes for (a) TaN and (b) PE-ALD.
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