1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Reversing the hydrogen silsesquioxane image by silicon nitride and silicon oxide chemical mechanical polishing
Rent:
Rent this article for
USD
10.1116/1.2357969
/content/avs/journal/jvstb/24/6/10.1116/1.2357969
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2357969

Figures

Image of FIG. 1.
FIG. 1.

(a) Graphical flowchart for the HSQ image reversal method using CMP. (b) Test pattern in thick HSQ on silicon. (c) Silicon nitride layer after CMP down to a thickness (and a few seconds of BOE dipping). (d) Silicon nitride layer after CMP and full HSQ removal in BOE.

Image of FIG. 2.
FIG. 2.

SEM images of (a) test pattern in thick HSQ on silicon, (b) reversed pattern in thick silicon oxide (from boron doped TEOS), (c) bird’s eye view of (b), and (d) the same pattern as in (b) and (c), but here the HSQ has been e-beam written using a lower exposure dose.

Tables

Generic image for table
TABLE I.

Etch rates and selectivities in buffered oxide etch (7:1) at .

Loading

Article metrics loading...

/content/avs/journal/jvstb/24/6/10.1116/1.2357969
2006-12-04
2014-04-20
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reversing the hydrogen silsesquioxane image by silicon nitride and silicon oxide chemical mechanical polishing
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2357969
10.1116/1.2357969
SEARCH_EXPAND_ITEM