Schematic diagram of the SP-CVD reactor system.
Flow sheet illustration programed nonuniformity and uniformity experiments.
Accurate interpretation of 4PP metrology data using a numerical quadrature technique.
Wafer profiles (deliberate nonuniformity design of experiments). Wafers W10, W14, and W17 belong to one group. Wafers W16, and W19 belong to the second group. Wafers W12, W15, W18, and W20 belong to the third group. Numbers 1, 2, and 3 refer to the three segments.
Plot showing linear models for each segment. The vertical error bars range from the minimum thickness to the maximum thickness obtained for that particular flow recipe (from Table I). The solid black line is the new set point. This line intersects the linear models and this point of intersection when projected onto the axis gives us the new recipe ( and flow rates). The square markers denote the average thickness in each segment for wafers W32–W41 processed using the segment-to-segment uniformity recipe.
Three linear models in one plot. The horizontal error bars on the averaged uniform profiles under each segment represent the range of WF6 flow rates that would have resulted in the same uniformity producing recipe needed for the set point of , due to the resolution of the mass flow controllers used to control the precursor mass flow rates.
Plot of the programed uniformity results shown in Table II.
Schematic of the SP-CVD reactor assembly.
Sensitivity (nm∕SCCM ) with respect to flow to segment 1 (left), segment 2 (center), and segment 3 (right).
Recipes and results for deliberate nonuniformity experiments. flow ratio in each . flow in parentheses. Ar Flow in each SCCM.
Programed uniformity results for W32–W41.
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