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Electrical properties of fluorine-doped silicon-oxycarbide dielectric barrier for copper interconnect
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10.1116/1.2366541
/content/avs/journal/jvstb/24/6/10.1116/1.2366541
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366541
/content/avs/journal/jvstb/24/6/10.1116/1.2366541
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/content/avs/journal/jvstb/24/6/10.1116/1.2366541
2006-11-02
2014-08-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical properties of fluorine-doped silicon-oxycarbide dielectric barrier for copper interconnect
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366541
10.1116/1.2366541
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