Analysis of acid yield generated in chemically amplified electron beam resist
(a) Kinetic traces and (b) observed rate constants of THF-solvated electrons obtained in the pulse radiolysis of C6 and PHS solutions in THF, monitored at .
Dependence of acid yield on acid generator concentration. PHS films with TPS-tf and C6 were exposed to a electron beam with the exposure dose of . For simulation results, the concentration of acid generated through the ionization of resist components (ionization path) and that generated through direct excitation and polymer sensitization (excitation path) are shown with the total acid concentration.
Conversion ratio of acid generator on exposure to electron beam with exposure dose of .
(a) Calculated acid concentration of PHS films with TPS-tf (without C6) on exposure to electron beam with exposure dose of . (b) The ratio of acid yield generated through excitation path to total acid yield.
Parameters used in the calculation of acid yields.
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