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Analysis of acid yield generated in chemically amplified electron beam resist
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10.1116/1.2366656
/content/avs/journal/jvstb/24/6/10.1116/1.2366656
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366656

Figures

Image of FIG. 1.
FIG. 1.

(a) Kinetic traces and (b) observed rate constants of THF-solvated electrons obtained in the pulse radiolysis of C6 and PHS solutions in THF, monitored at .

Image of FIG. 2.
FIG. 2.

Dependence of acid yield on acid generator concentration. PHS films with TPS-tf and C6 were exposed to a electron beam with the exposure dose of . For simulation results, the concentration of acid generated through the ionization of resist components (ionization path) and that generated through direct excitation and polymer sensitization (excitation path) are shown with the total acid concentration.

Image of FIG. 3.
FIG. 3.

Conversion ratio of acid generator on exposure to electron beam with exposure dose of .

Image of FIG. 4.
FIG. 4.

(a) Calculated acid concentration of PHS films with TPS-tf (without C6) on exposure to electron beam with exposure dose of . (b) The ratio of acid yield generated through excitation path to total acid yield.

Tables

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TABLE I.

Parameters used in the calculation of acid yields.

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/content/avs/journal/jvstb/24/6/10.1116/1.2366656
2006-11-30
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Analysis of acid yield generated in chemically amplified electron beam resist
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366656
10.1116/1.2366656
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