Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
Electron beam pattern used to determine feature size in experiments. There are 40 squares in each run at a different dose point. Each square contains a series of pillars with a pitch of .
Scanning electron micrographs of HSQ pattern: (a) low magnification micrograph with series of pillars; (b) high magnification micrograph of individual pillars.
Comparison of feature sizes of all three atmospheres over a -long e-beam writing time. The data are shown with a least squares line of averaged data points along with the average points at each time.
Comparison of feature sizes of all three atmospheres at various times with a period. The data are shown with a best-fit line of averaged data points along with the average points at each time.
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