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Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
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10.1116/1.2366697
/content/avs/journal/jvstb/24/6/10.1116/1.2366697
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366697
/content/avs/journal/jvstb/24/6/10.1116/1.2366697
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/content/avs/journal/jvstb/24/6/10.1116/1.2366697
2006-11-30
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366697
10.1116/1.2366697
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