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Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
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10.1116/1.2366697
/content/avs/journal/jvstb/24/6/10.1116/1.2366697
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366697
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Electron beam pattern used to determine feature size in experiments. There are 40 squares in each run at a different dose point. Each square contains a series of pillars with a pitch of .

Image of FIG. 2.
FIG. 2.

Scanning electron micrographs of HSQ pattern: (a) low magnification micrograph with series of pillars; (b) high magnification micrograph of individual pillars.

Image of FIG. 3.
FIG. 3.

Comparison of feature sizes of all three atmospheres over a -long e-beam writing time. The data are shown with a least squares line of averaged data points along with the average points at each time.

Image of FIG. 4.
FIG. 4.

Comparison of feature sizes of all three atmospheres at various times with a period. The data are shown with a best-fit line of averaged data points along with the average points at each time.

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/content/avs/journal/jvstb/24/6/10.1116/1.2366697
2006-11-30
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2366697
10.1116/1.2366697
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