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Etching of Pyrex glass substrates by inductively coupled plasma reactive ion etching for micro/nanofluidic devices
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10.1116/1.2388959
/content/avs/journal/jvstb/24/6/10.1116/1.2388959
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2388959
/content/avs/journal/jvstb/24/6/10.1116/1.2388959
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/content/avs/journal/jvstb/24/6/10.1116/1.2388959
2006-12-04
2014-12-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching of Pyrex glass substrates by inductively coupled plasma reactive ion etching for micro/nanofluidic devices
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2388959
10.1116/1.2388959
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