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Pattern noise in electron beam resists: PMMA, KRS-XE, TOK, HSQ
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10.1116/1.2393248
/content/avs/journal/jvstb/24/6/10.1116/1.2393248
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2393248

Figures

Image of FIG. 1.
FIG. 1.

SEM of the bottom right sections of a contact array in PMMA exposed at .

Image of FIG. 2.
FIG. 2.

Image processing flow for detecting contacts.

Image of FIG. 3.
FIG. 3.

SEM images of the bottom right corner of the contact grid: (a) KRS-XE at , (b) TOK at , (c) PMMA at , and (d) HSQ at .

Image of FIG. 4.
FIG. 4.

Plot of contacts printed vs exposure dose for CARSs: KRS-XE and TOK. Plots with (SN) show the expected noise based solely on shot noise prediction.

Image of FIG. 5.
FIG. 5.

Plot of contacts printed vs exposure dose for nonamplified resists: PMMA and HSQ. Plots with (SN) show the expected noise based solely on shot noise prediction.

Image of FIG. 6.
FIG. 6.

SEM images of contacts exposed at : (a) KRS-XE and (b) KRS-XE with top coat.

Tables

Generic image for table
TABLE I.

Summary of data for 24 and contacts exposed in PMMA, HSQ, KRS-XE, and TOK.

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/content/avs/journal/jvstb/24/6/10.1116/1.2393248
2006-11-30
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pattern noise in electron beam resists: PMMA, KRS-XE, TOK, HSQ
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2393248
10.1116/1.2393248
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