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Orientation dependence of linewidth variation in sub- Gaussian e-beam lithography and its correction
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10.1116/1.2393292
/content/avs/journal/jvstb/24/6/10.1116/1.2393292
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2393292
/content/avs/journal/jvstb/24/6/10.1116/1.2393292
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/content/avs/journal/jvstb/24/6/10.1116/1.2393292
2006-11-30
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Orientation dependence of linewidth variation in sub-50-nm Gaussian e-beam lithography and its correction
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2393292
10.1116/1.2393292
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