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Characterization of hydrogen silsesquioxane as a inductively coupled plasma etch mask for air-clad InP-based quantum well waveguide fabrication
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10.1116/1.2395952
/content/avs/journal/jvstb/24/6/10.1116/1.2395952
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2395952
/content/avs/journal/jvstb/24/6/10.1116/1.2395952
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/content/avs/journal/jvstb/24/6/10.1116/1.2395952
2006-12-04
2014-12-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characterization of hydrogen silsesquioxane as a Cl2∕BCl3 inductively coupled plasma etch mask for air-clad InP-based quantum well waveguide fabrication
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2395952
10.1116/1.2395952
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