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Contribution of photoacid generator to material roughness
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10.1116/1.2395954
/content/avs/journal/jvstb/24/6/10.1116/1.2395954
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2395954

Figures

Image of FIG. 1.
FIG. 1.

Chemical structures of starting and partially deprotected terpolymer. Polymer J (, , ) is a typical resist terpolymer. Polymer K1 (, , , ) mimics the resist polymer in a typical state of partial acid catalyzed deprotection.

Image of FIG. 2.
FIG. 2.

Film roughness of PFBS-type PAG containing films as a function of depth into the resist.

Image of FIG. 3.
FIG. 3.

Film roughness of DTBPI-type PAG containing films as a function of depth into the resist.

Image of FIG. 4.
FIG. 4.

Film roughness of CS-type PAG containing films as a function of depth into the resist.

Image of FIG. 5.
FIG. 5.

Film roughness of PFBzS-type PAG containing films as a function of depth into the resist.

Image of FIG. 6.
FIG. 6.

Example of NMR shift of C1 and C4 carbons of isopropyl phenol in the presence of DTBPI-PFBS PAG. The spectra containing the added PAG also shows minor peaks associated with the PAG.

Image of FIG. 7.
FIG. 7.

Relationship of PAG containing film dissolution rates with C1 NMR shift.

Image of FIG. 8.
FIG. 8.

Linear relationship of PAG containing film log (dissolution rates) with C1 NMR shift excluding iodonium PAGs.

Image of FIG. 9.
FIG. 9.

Linear relationship of PAG IMR with C1 NMR shift excluding three outlying PAGs.

Image of FIG. 10.
FIG. 10.

Linear relationship of PAG IMR with C1 NMR shift both including and excluding iodonium PAGs.

Image of FIG. 11.
FIG. 11.

Linear relationship of log(DR) with PAG IMR both including and excluding iodonium PAGs.

Tables

Generic image for table
TABLE I.

Summary of PAG type, NMR shift, dissolution rate, and IMR value, all at 5% loading in poly-K1.

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TABLE II.

NMR shift of the C1 carbon of isopropylphenol in the presence of different types and amounts of PAG.

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TABLE III.

NMR shifts of the C1 carbon of isopropylphenol in the presence of PAG and different types and amounts of base.

Generic image for table
TABLE IV.

NMR shift of the C1 carbon of isopropylphenol in the presence of PAG and base with different amounts of acetic acid added.

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/content/avs/journal/jvstb/24/6/10.1116/1.2395954
2006-11-30
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Contribution of photoacid generator to material roughness
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2395954
10.1116/1.2395954
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