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Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists
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10.1116/1.2395957
/content/avs/journal/jvstb/24/6/10.1116/1.2395957
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2395957
/content/avs/journal/jvstb/24/6/10.1116/1.2395957
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/content/avs/journal/jvstb/24/6/10.1116/1.2395957
2006-11-30
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/24/6/10.1116/1.2395957
10.1116/1.2395957
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