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Local line edge roughness in microphotonic devices: An electron-beam lithography study
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10.1116/1.2426978
/content/avs/journal/jvstb/25/1/10.1116/1.2426978
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/1/10.1116/1.2426978

Figures

Image of FIG. 1.
FIG. 1.

PSF: (a) energy distribution as predicted by DMC4-Gaussian (points), four Gaussian point spread function fitted to DMC and independent experimental PSF (MIT) (normalized); (b) zoom-in comparison between the raw DMC data with the experimental (and independent) PSF. Notice the excellent agreement between model and experiment.

Image of FIG. 2.
FIG. 2.

Relative intensity along the central line of a resonator (400 linewidth, and gap between the bus and ring).

Image of FIG. 3.
FIG. 3.

E-beam writing of rings: (a) multiple-polygon method with 360 polygons; (b) single-pixel writing. Notice the smoothness of the second case.

Image of FIG. 4.
FIG. 4.

Edge detection and fitting: (a) line; (b) ring.

Image of FIG. 5.
FIG. 5.

Experimental CD variation at the dose of : (a) along the bus of the -gap resonator; (b) along the pure bus. Average of nine images.

Image of FIG. 6.
FIG. 6.

Correlation length from height-to-height correlation function: (a) pure line; (b) resonator bus.

Image of FIG. 7.
FIG. 7.

Local LER for (a) the next-to-ring bus edge of -gap resonator; (b) pure line. The black line is for a local LER computed with a window of and the gray with . Notice how no structure is observed in (b) relative to (a).

Image of FIG. 8.
FIG. 8.

Propagation loss as a function of roughness and correlation length; estimation with the determined LER and correlation length.

Tables

Generic image for table
TABLE I.

Gaussian fit to the PSF CMIT stack.

Generic image for table
TABLE II.

Results of LER analysis: refers to the standard deviation of each term (see text), while is the correlation length.

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/content/avs/journal/jvstb/25/1/10.1116/1.2426978
2007-01-26
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Local line edge roughness in microphotonic devices: An electron-beam lithography study
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/25/1/10.1116/1.2426978
10.1116/1.2426978
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